Problems caused by particles in the photolithography process become more serious as the manufacturing of ICs becomes more precise.
WT, IR ,KR and AR series
- Eliminate particles on the photomask
- Improve the lifetime of photomask and reticle
Features of the WT/IR/KR/AR series
The requirements for LCD photolithography are getting even more strict as color TFT LCDs offer higher resolution and better image quality.
The UP series meets these requirements by applying superior film technology to the pellicles for large LCD photomasks.
UP series
- Eliminate particles on the photomask
- Make the photomask maintenance easier through less frequent cleaning
The BP series was developed for projection exposure systems of PWB, TAB, and COF, which require even more strict cleanliness.
BP series
- Eliminate particles on the photomask
- Make the photomask maintenance easier through less frequent cleaning
