

As shown in the figure at the right, if no magnetic field (magnetic flux density) is applied to a semiconductor film, the carriers (electrons) move straight in the semiconductor toward the electric field direction by the force qE generated by the applied electric field. However, if a magnetic field is applied, the Lorentz force qvB forces to bend the moving direction of the carriers. Where, q represents elementary charge, E represents strength of electric field, v represents electron speed, and B represents magnetic flux density. As the moving distance is longer, the resistance value increases.
In the low magnetic field (approx. 0.4T or less), the rate of magnetoresistive change D R/R0 is proportional to the square root of the product of the semiconductor film electron mobility m and magnetic flux density B that is vertically applied to the semiconductor film, and in the high magnetic field range (approx. 0.4T or more) it is proportional to μ and B.
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RB: Resistance value in magnetic field
R0: Resistance value in non-magnetic field


RB: Resistance value in magnetic field
R0: Resistance value in non-magnetic field
m : Electron mobility
B: Magnetic flux density


RB: Resistance value in magnetic field
R0: Resistance value in non-magnetic field
m : Electron mobility
B: Magnetic flux density
* The higher the electron mobility in the semiconductor becomes, the larger the magnetoresistive effect is.
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As shown above, the semiconductor magnetoresistive effect depends on the electron mobility m of the material. In other words, the higher the electron mobility of the material, the larger the magnetoresistive effect is. Therefore, InSb is used as a material for the semiconductor magnetoresistive element, because it has the highest electron mobility among the III-V compound semiconductors that have larger electron mobility. Since InSb has the highest electron mobility of 78000 (cm2/Vsec) among the semiconductors, it is a suitable material for semiconductor magnetoresistive element.