February 19, 2008
Asahi Kasei EMD Corporation

Start-up of new plant for Pimel™ photosensitive polyimide precursor
 
Asahi Kasei EMD has begun operation of a new plant in Fuji City, Shizuoka, for production of Pimel™ photosensitive polyimide precursor. Used by major chip manufacturers throughout the world, Pimel™ is the world's leading material for the formation of semiconductor buffer coats.

Together with a previously established plant at the same site, the new plant will enable reliable supply of Pimel™ even as robust demand growth continues in applications ranging from cell phones to home electronics. Demand growth for photosensitive material for semiconductor buffer coats is particularly strong due to the superior productivity and precision patterning it enables when compared to non-photosensitive material.

The field of electronics materials is a key focus for operations expansion in the Asahi Kasei Group's Growth Action – 2010 strategic mid-term initiative. In addition to Pimel™ production, the new plant will also serve as a base for production of innovative new materials that meet emerging performance demands in line with technological advances in the rapidly evolving semiconductor industry.
 
Profile of the new plant
Location:
Asahi Kasei Group plant and laboratory site in Fuji City, Shizuoka
Start-up:
February 2008
Production capacity:
Confidential; sufficient, together with the other plant in Fuji, to meet demand growth for approximately ten years.

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