Photosensitive polyimide/PBO PIMEL™

Product lineup

PIMEL™ product lineup

TMAH developable positive tone type

Main polymer component: Polybenzoxazole(PBO) precursor or Novel Phenolic Resin
Standard photoresist developer(2.38%TMAH) is applicable.

Solvent developable negative tone type

Main polymer component: Polyimide(PI) precursor
Main developer component: Cyclopentanone or cyclohexanone

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