EUTEC™ FS - Installation case study 6

(6) Cleaning of silicon wafer (slicing process)

FSSemiconductor industry
Aim of EUTEC installation Separation of cleaner from rinsing fluid
Expected benefits of EUTEC installation Prolong service life of cleaning fluid and prevent re-attachment of oil to silicon wafer
Cleaning target Silicon wafer
Type of dirt/contaminant Cutting oil/fluid
Type of cleaner being used Semi-aqueous cleaner
Operating temperature of cleaner 60℃
Model of oil-water separator used (process flow rate) TH-30 (5L/min)

Installation flow diagram

*Click here for more examples of cleaning-related installation flows.

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