A New Option for Fine Circuit Pattern
The TA Series enables fine circuit patterns of L/S=2/2 µm or less. Using DFR instead of liquid resist enables simple process design and simultaneous double-sided processing. Compatible with both stepper exposure and LDI exposure. Contributes to circuit formation for next-generation and future package substrates. and interposers.
Details of the TA Series
Features: Fine pattern technology of Sunfort™ realizes fine circuit patterns with L/S=2/2 µm or less.
The TA Series is developed by integrating Sunfort™ technologies to meet the fine circuit pattern needs of next-generation and future semiconductor packages. As a dry film type, it enables simultaneous double-sided lamination and simple process design. Compatible with both stepper and LDI exposure, it meets a wide range of customer needs.
Fine Circuit Pattern Capability: The TA Series enables fine circuit pattern with L/S=2/2 µm or less, achieving fine cuicuit pattern required for next-generation semiconductors.
Compatibility with Multiple Exposure Methods: Supports both stepper and LDI exposure methods, covering a wide range from flexible prototype manufacturing requiring frequent design changes to mass production.
Potential Substitute for Liquid Resist: Enables fine circuit pattern previously achievable only with liquid resists and can be a potential replacement for liquid resists.
Ease of use: Ease of use not found in liquid resists, such as simultaneous double-sided lamination and no need for thickness adjustment.
Applications
Interposers: Compatible with next-generation large panel-type interposers, enabling ultra-fine wiring on large-area, double-sided panels.
Advanced Package Substrates: Fine circuit pattern required for substrates used in AI chips and high-speed communication devices.
High-Frequency Devices: Fine circuit pattern essential for high-frequency components used in 5G communications and autonomous vehicles.
Sensor Devices: Fine circuit pattern formation for compact, high-precision sensors embedded in IoT and wearable devices.
Glass Core Substrates: Realizes fine circuit pattern formation on glass substrates anticipated for application in next-generation semiconductor packages and high-speed communication devices.
Resist Pattern
This is an electron microscope image showing the fine resist pattern formation of the TA Series.
For Inquiries or Sample Requests
Are you looking for solutions for extremely fine pattern formation? Please consider Sunfort™ "TA Series." For prototype or sample requests, you can contact us via this link.