DFR for Advanced Substrate Manufacturing
SUNFORT™ "UFP&SA Series" is designed for stepper exposure. This product enables fine pattern formation and is ideal for manufacturing package substrates that require high-performance circuits. Its high resolution and good adhesion allow for the realization of complex circuit designs.
Details of the UFP&SA Series
Features: Precision Circuits Enabled by High Resolution and Adhesion
High Resolution and Adhesion: The UFP&SA Series offers high resolution and high adhesion necessary for fine pattern formation, supporting precise patterning with stepper exposure.
Good Rectangularity: Exceptional rectangularity with minimal resist footing results in high-quality copper circuits after plating, ensuring superior electrical characteristics and stable signal transmission.
Good Chemical Resistance: Exhibits high resistance to chemicals used in plating processes, minimizing resist damage and ensuring manufacturing stability.
High Sensitivity and Development Speed: Enhanced sensitivity and rapid development increase production line throughput, boosting efficiency in mass production.
Applications
SUNFORT™ "UFP&SA Series" is suitable for manufacturing high-performance package substrates and enables products utilizing advanced technologies such as AI servers and mobile devices. It holds a high market share globally.
FC-BGA Type (for High-Performance Servers and AI): Package substrates specialized for server and AI applications, meeting demands for fine and high-density circuit formation to support advanced computational processing.
FC-CSP Type (for Mobile Devices, etc.) : Designed for substrates used in smartphones and various semiconductor packages, achieving compact and high-density circuit formation.
Resist Pattern
This is an electron microscope image showing the high-precision pattern formation of the UFP&SA Series.
For Inquiries or Sample Requests
For Prototype or Sample Requests, you can contact us via this link.Please consider SUNFORT™ "UFP&SA Series" for high-density pattern formation using stepper exposure.